By Rolf Haug
The 2008 Spring assembly of the Arbeitskreis Festkörperphysik used to be held in Berlin, Germany, among February 24 and February 29, 2008 together with the 72nd Annual assembly of the Deutsche Physikalische Gesellschaft. The 2008 assembly was once the most important physics assembly in Europe and one of the greatest physics conferences on the planet in 2008.
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Extra resources for Advances in Solid State Physics 48
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First, a thin ﬁlm that acts as a mask is deposited on a subtrate. Here, in both cases (rigid and ﬂexible), it will be a photoresist. Second this ﬁlm is exposed to stress, as described later on for the diﬀerent cases, resulting in thin ﬁlm cracks. Third the material that will form nanowires is deposited, it will be deposited into the cracks and on top of the thin ﬁlm. As fourth step the thin ﬁlm will be removed together with the on top deposited material, while the material in the cracks, which is in contact with the substrate will stay.